Chip, das Mikroskop TG2U überprüft

 【Introduction】:
 TG2U lithography is used into the LSI, sensor, surface wave component, magnetic bubble, microwave, CCD and in such a way on.

 【Remark】:
 Lithography TG2U Technical parameter:
 1.Template size:
 a.100×100×2-3mm;
 b.75×75×2-3mm:
 2. silicone size: Φ50-Φ75mm, really LINE width 3-4цm;
 3. comparative DISPLACEMENT between template and silicone:
 a.X、 Y ≥±2.5mm;
 b.θ (rotate) ≥±5°;
 4.support station (silicone) rotate Z of axies: rough tuning 360°, fine tuning ±5;
 5.Integrated moving rank OF working station: X、 Y integrate Φ75mm;
 6. the space between ball basical station and template: 0-7mm;
 7. exposure system: GCQ200W more over high pressure ball Hg, exposure wave length: 300~436nm;
 8.engergy is NOT less than 407nm OF wave length; 7mw/cm;
 9. uneven is within Φ75mm: ±5%:
 10. lighting wave length: ≈545nm;
 11. exposure time: O.01 seconds-99.99 of minutes;
 12. the focusing rank OF binocular: 13mm;
 13. the zoom shot OF binocular:
 A. pair ocular: lOX, 16X;
 in flat field objective: 6X, 9X, 15X;
 C. totally zoom shot out: 60X-240X;
 14. vacuum touching pressure: ≥O.7Kgf;
 15. power supply:
 a.frequency: 50HZ (Z);
 b.rotated input VOL-meets: 190V-230V;
 more c.power consumption: ≤300VA;
 16.Dimension: 1000X850X980mm （2 boxes）
 17.Weight: ≈200Kg;
 (1) vacuum supply: ≥450mm Hg;
 (2) The DEVICE OF air supply stability is below
 ADD: If the user had any special request, please contact with US.